Sagar Saxena

Senior Product Engineer, Siemens EDA · Person

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Sagar Saxena - Senior Product Engineer, Siemens EDA. Tracked across 8 mentions in podcasts and expert conversations analyzed by Sonic.

What Sagar Saxena has said

Leading-edge logic and memory foundries are adopting curvilinear Optical Proximity Correction (OPC) from Siemens EDA for their most advanced manufacturing processes.

bullish·Sagar Saxena

The Siemens EDA website contains a collection of conference papers and technical publications that showcase advances and real-world applications of curvilinear Optical Proximity Correction (OPC) and related technologies.

neutral·Sagar Saxena

Siemens EDA's curvilinear Optical Proximity Correction (OPC) technology is currently being used in production environments and is no longer a research project.

bullish·Sagar Saxena

Leading-edge logic and memory foundries are adopting curvilinear Optical Proximity Correction (OPC) from Siemens EDA for their most advanced manufacturing processes.

Expert perspectiveSagar SaxenaJul 10

Siemens EDA's curvilinear Optical Proximity Correction (OPC) technology is currently being used in production environments and is no longer a research project.

Expert perspectiveSagar SaxenaJul 10

A key innovation in Siemens EDA's Optical Proximity Correction (OPC) framework is the decoupling of 'sites,' where accuracy is evaluated, from 'anchor points,' which guide how corrections are applied.

Expert perspectiveSagar SaxenaJul 10

Siemens EDA has developed a 'vector-based decoupled site and anchor point framework' to address the challenges of Optical Proximity Correction (OPC) for curvilinear masks.

Expert perspectiveSagar SaxenaJul 10

The Optical Proximity Correction (OPC) framework from Siemens EDA is a vector-based approach, representing shapes using their mathematical descriptions of points, lines, and curves rather than as a co...

Expert perspectiveSagar SaxenaJul 10

By decoupling sites and anchor points, Siemens EDA's framework allows for placing optimization sites only where accuracy is most critical, such as at tight pitches, on complex curves, or in known hots...

Expert perspectiveSagar SaxenaJul 10

Siemens EDA's vector-based OPC framework is designed to reduce unnecessary computation, resulting in simpler recipes and faster turnaround times for curvilinear masks.

Expert perspectiveSagar SaxenaJul 10

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